Economical Analysis and Optimization of a Low Pressure Chemical Vapor Depositioni (LPCVD) Reactor
نویسندگان
چکیده
An economical analysis of the LPCVD hot wall tubular reactor functioning is presented including equipment amortization, clean room location, supplies, maintenance, labor, gas and energy consumption. From a technical point of view, CVDl model is used to characterise the phenomena involved during polysilicon deposition, linking growth rate distribution to operating conditions. An optimization is then realized in three different cases will1 and witllout a temperature profile. By this study the main c o s a of C V D operation such as gases consu~np~ion and equipment amortization are identified, and the total cost has been drastically reduced by using a temperature profile.
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